PROCESS FOR CHEMICAL-MECHANICAL POLISHING OF COBALT WITH HIGH COBALT REMOVAL SPEEDS AND REDUCED COBALT CORROSION

摘要

A method of chemical mechanical polishing of cobalt to planarize the surface and remove at least a portion of the cobalt from a substrate. The method includes providing a polishing composition containing as original components: water; an oxidizing agent; colloidal silica abrasive particle; Aspartic acid or salts thereof; a phosphonic acid having an alkyl group having more than ten carbon atoms, the phosphonic acid having the alkyl group having more than ten carbon atoms included in amounts sufficient to provide high cobalt removal rates of ≥ 2000 Å / min and substantial cobalt corrosion inhibition will; and providing a chemical mechanical polishing pad having a polishing surface; Creating dynamic contact at an interface between the polishing pad and the substrate; and dispensing the polishing composition to the polishing surface at or near the interface between the polishing pad and the substrate; whereby a part of the cobalt is polished away and cobalt corrosion is substantially inhibited.