CHARACTERIZATION SYSTEM FOR A LOADED PARTICLE BEAM AND MACHINE FOR PRODUCING A LOADED PARTICLE BEAM COMPRISING SUCH A SYSTEM

摘要

The invention relates to a system for characterizing (1) a beam (F) of charged particles, the system comprising a stack, said stack comprising an ultrathin pattern (20) formed of an electrically conductive material; a thin substrate (10) carrying said pattern; the stack forming an emitting electrode (2), said emitting electrode being capable of emitting secondary electrons (es) near a surface (22) of said pattern when said emitting electrode is crossed by the beam of charged particles.