Process for preparing a coated glass substrate

摘要

A chemical vapour deposition process for preparing a coated glass substrate 2 by depositing a layer based on SiCO 3 and/or SiNO on the surface of the glass substrate, exposing the layer to a gaseous mixture comprising water, then depositing a layer based on a TCO (Transparent Conductive Oxide), preferably fluorine doped tin oxide 4 thereon. The method is based on the discovery that adding oxygen by the gaseous mixture reduces sheet resistance to 5-21 ohms/sq, with a haze of 0.5-5%. The mixture may comprise water and oxygen in a ratio of at least 1.5:1, preferably 3:1, preferably 25 to 65% volume water and 2 to 20% volume oxygen. The water is preferably delivered at between 50 and 350 litres per minute, oxygen preferably at 15 to 55 litres per minute. The method may be carried out in a float bath, and the substrate may be at a temperature of 640-740 °C. The SiCO and/or SiNO can be deposited in a non-oxidizing atmosphere or with a silicon, carbon, and oxygen source. A tin oxide layer may be interposed between this and the TCO. The coated glazing product 1 is designed for photovoltaic or solar cells.