A holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber, an apparatus for depositing a layer on a substrate, and a method for aligning a mask carrier with a substrate carrier supporting a substrate

摘要

The present disclosure provides a holding arrangement 100 for supporting a substrate carrier 130 and a mask carrier 140 during layer deposition in a processing chamber. The holding arrangement 100 includes two or more alignment actuators connectable to at least one of the substrate carrier 130 and the mask carrier 140, wherein the holding arrangement 100 is either in the first plane or in the first plane. It is configured to support the substrate carrier 130 parallel to one plane, wherein the first alignment actuator 110 of the two or more alignment actuators is, at least in the first direction 1, the substrate carrier Configured to move the 130 and the mask carrier 140 with respect to each other, wherein the second alignment actuator 120 of the two or more alignment actuators comprises at least a first direction 1, and It is configured to move the substrate carrier 130 and the mask carrier 140 with respect to each other in a second direction 2 different from the first direction 1, wherein the first direction 1 and the second direction (2) is in the first plane.