Polishing agent for synthetic quartz glass substrate, manufacturing method thereof, and polishing method for synthetic quartz glass substrate

摘要

PROBLEM TO BE SOLVED: To provide a polishing agent for a synthetic quartz glass substrate having high polishing speed, and enabling the occurrence of defect caused by polishing to be sufficiently reduced.SOLUTION: The polishing agent for a synthetic quartz glass substrate is provided which includes a polishing particle and water, and in which the polishing particle includes a silica particle as a matrix particle carrying on the surface thereof at least one rare earth element selected from cerium, and other trivalent rear earth elements other than cerium.SELECTED DRAWING: Figure 1