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Dinitrogen Functionalization: Exploring Dinitrogen Cleavage And Nitrogen-Carbon Bond Forming Reactions With Group 4 Metallocene Compounds

机译:二氮官能化:探讨与第4组茂金属化合物的二氮裂解和氮碳键形成反应

摘要

A family of zirconocene and hafnocene compounds bearing side-on bound dinitrogen ligands were prepared and studied for their capability to promote a variety of nitrogen-carbon bond forming reactions. Most notably, these N2 compounds underwent N-N cleavage coupled with C-N and C-C bond formation upon addition of excess carbon monoxide, forming unprecedented oxamidide complexes. For each zirconium example dissociation of N2 and formation of the corresponding dicarbonyl species competes with N-N cleavage. For chiral ansa-metallocene examples, two stereoisomeric oxamidide products were observed in a ratio dependent on the pressure of CO added. In all cases, protonolysis liberated free oxamide, demonstrating synthesis of a useful organic product directly from N2 and CO. For the ansahafnocene, observation and isolation of a bridging isocyanate species at short reaction times prompted a kinetic study of the mechanism for oxamidide formation. Kinetic and isotopic exchange studies are consistent with a mechanism whereby N2 cleavage is fast and precedes C-C bond formation. When stoichiometric CO was added to the hafnocene N2 compounds, new products arising from N-N cleavage coupled with C-H activation of a cyclopentadienyl substituent were observed, suggesting the intermediacy of a [MICRO SIGN]-nitride species. This reactive intermediate was also intercepted with added dihydrogen and terminal acetylenes. The hafnocene oxamidide products were elaborated by the addition of various heterocumulenes, alkyl halides, and silanes resulting in new nitrogen-carbon or nitrogen-silicon bonds. Subsequent protonoylsis of the functionalized hafnocene oxamidato species liberated the corresponding substituted oxamides in high yield. In addition to CO-induced N2 cleavage, other methods of N2 functionalization were also explored. Addition of two equivalents carbon dioxide to ansa-metallocene dinitrogen compounds resulted in selective insertion into each metal-nitrogen bond, forming C2-symmetric N,N'-dicarboxylated hydrazido compounds. These compounds could be elaborated by the addition of trimethyliodosilane or methyl triflate to form additional N-C or N-Si bonds, and protonolysis released the corresponding carboxylated hydrazines. Finally, for one hafnocene dinitrogen compound, methyl triflate addition resulted in formation of a monomeric hafnocene diazenide species arising from direct alkylation of coordinated N2. Further exposure to methyl triflate resulted in additional N-C formation, furnishing a rare triflate hafnocene hydrozanato compound.
机译:制备了带有侧键结合的二氮配体的锆茂和ha茂化合物,并研究了它们促进各种氮碳键形成反应的能力。最显着的是,这些N2化合物在添加过量的一氧化碳后进行了N-N裂解,并形成C-N和C-C键,形成了前所未有的草酰胺络合物。对于每个锆实例,N 2的解离和相应的二羰基物质的形成与N-N裂解竞争。对于手性ansa-茂金属的实例,观察到两种立体异构的草酰胺酰胺产物,其比例取决于所加入的CO的压力。在所有情况下,质子分解过程均会释放出游离的草酰胺,这表明可直接从N2和CO合成有用的有机产物。对于Ansahafnocene,在短反应时间内观察和分离桥接的异氰酸酯物种可促进对草胺酰胺形成机理的动力学研究。动力学和同位素交换研究与N2裂解快速且先于C-C键形成的机理一致。当将化学计量的CO添加到ha茂N2化合物中时,观察到N-N裂解与环戊二烯基取代基的C-H活化相结合而产生的新产物,表明[MICRO SIGN]-氮化物是中间产物。该反应性中间体也被添加的二氢和末端乙炔截获。通过添加各种杂枯烯,烷基卤化物和硅烷精制ha茂金属的草酰胺化产物,从而产生新的氮碳键或氮硅键。随后的功能化ha茂盛草酰胺化物种的质子酰基化以高产率释放了相应的取代的草酰胺。除了CO诱导的N2裂解外,还探索了N2功能化的其他方法。将两个当量的二氧化碳加到ansa-茂金属二氮化合物中导致选择性插入每个金属氮键中,形成C2对称的N,N'-二羧化肼基化合物。这些化合物可通过添加碘代三甲基硅烷或三氟甲磺酸甲酯形成额外的N-C或N-Si键来进行精制,然后质子分解释放出相应的羧化肼。最后,对于一种ha茂二氮化合物,三氟甲磺酸甲酯的添加导致配位N2的直接烷基化形成单体ha茂二烯化合物。进一步暴露于三氟甲磺酸甲酯会导致另外的N-C形成,从而提供了一种罕见的三氟甲磺酸ha茂茂氢化氮杂氮化合物。

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    Knobloch Donald;

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  • 年度 2011
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