Effect of capacitive coupling in a miniature inductively coupled plasma source

摘要

Two-dimensional axisymmetric particle-in-cell simulations with a Monte Carlo collision algorithm (PIC-MCC) have been conducted to investigate the effect of capacitive coupling in a miniature inductively coupled plasma source (mICP) by using two models: an inductive model and a hybrid model. The mICP is 3 mm in radius and 6 mm in height with a three-turn planar coil, where argon plasma is sustained. In the inductive model, the coil is assumed to be electrostatically shielded, and thus the discharge is purely inductive coupling. In the hybrid model, we assume that the different turns of the coil act like electrodes in capacitive discharge to include the effect of capacitive coupling. The voltage applied to these electrodes decreases linearly from the powered end of the coil towards the grounded end. The numerical analysis has been performed for rf frequencies in the range of 100–1000 MHz, and the power absorbed by the plasma in the range of 5–50 mW at a fixed pressure of 500 mTorr. The PIC-MCC results show that potential oscillations at the plasma-dielectric interface are not negligible, and thus the major component of the absorbed power is caused by the axial motion of electrons in the hybrid model, although almost all of the power absorption is due to the azimuthal motion of electrons in the inductive model. The effect of capacitive coupling is more significant at lower rf frequencies and at higher absorbed powers under the calculation conditions examined. Moreover, much less coil currents are required in the hybrid model.