AES (Auger Electron Spectroscopy) And RBS (Rutherford Backscattering) Studies of TiN and TiC Coatings Prepared by the Activated Reactive Evaporation (ARE) Process

摘要

TiN/sub x/ and TiC/sub x/ films were deposited by the Activated Reactive Evaporation (ARE) process under different process conditions. The films were studied by Auger electron spectroscopy (AES) and Rutherford backscattering (RBS) and for both techniques standards were used. The low sensitivity of RBS to C and N employing 1.8 MeV He sup + ions was enhanced by using 1.5 MeV H sup + ions, but the resulting non-Rutherford scattering required the use of standards although RBS is potentially a standardless method. A correlation was found between the chemical composition of TiN/sub x/ and TiC/sub x/ films and the partial pressure of N sub 2 and C sub 2 H sub 2 , respectively. (ERA citation 12:037286)