首页> 美国政府科技报告 >Diffusion Length Measurements in Bulk and Epitaxially Grown 3-5Semiconductors Using Charge Collection Microscopy.
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Diffusion Length Measurements in Bulk and Epitaxially Grown 3-5Semiconductors Using Charge Collection Microscopy.

机译:使用电荷收集显微镜测量体积和外延生长3-5个半导体的扩散长度。

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Diffusion lengths and surface recombination velocities were measured in GaAs diodes and InP finished solar cells. The basic techniques used was charge collection microscopy also known as electron beam induced current (EBIC). The normalized currents and distances from the pn junction were read directly from the calibrated curves obtained while using the line scan mode in an SEM. These values were then equated to integral and infinite series expressions resulting from the solution of the diffusion equation with both extended generation and point generation functions. This expands previous work by examining both thin and thick samples. The surface recombination velocity was either treated as an unknown in a system of two equations, or measured directly using low e(-) beam accelerating voltages. These techniques give accurate results by accounting for the effects of surface recombination and the finite size of the generation volume.

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