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Magnetic force microscopy of single-domain cobalt dots patterned using interference lithography

机译:使用干涉光刻法图案化的单畴钴点的磁力显微镜

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We have fabricated arrays of Co dots of diameters 100 and 70 nm using interference lithography. Density of these arrays is 7.2x10(sup 9)/in(sup 2). Magnetic force microscopy indicate that the Co dots are single domain with moments that can be controlled to point either in-plane or out-of-plane. Interference lithography is a process that is easily scaled to large areas and is potentially capable of high throughput. Large, uniform arrays of single-domain structures are potentially useful for high-density, low-noise data storage.

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