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Exposure Study for Dry-Film Photoresists.

机译:干膜光刻胶的曝光研究。

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Ultraviolet-light exposure settings have been established for a Gyrex Conex Model 971exposure unit to provide optimum exposure for DuPont Riston negative-acting dry-film photoresist Types 6S, 16,and 30,as well as for the new Types 110S and 116S. The amount of light undercut has been determined for Types 110S and 116S when used with both negative and positive phototools for the production of printed wiring boards. (ERA citation 02:007862)

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