Method of Preparing High-Temperature-Stable Thin-Film Resistors

摘要

A method of preparing composite, high-temperature-stable, thin-film resistors by chemical vapor deposition is disclosed. The resistor film of tungsten-silicon is formed from gaseous decomposable compounds of tungsten and silicon. The bulk resistivity of the film can be controlled and reproduced and the temperature coefficient of resistivity can be controlled over a range of values by process parameter variation. (ERA citation 05:018788)