Influence of Surface Structures on Sputtering: Angular Distributions from Pyramid-Covered Single Crystal Copper

摘要

The angular distribution of 40 keV argon sputtered copper has been measured. Comparison is made of the distributions from a flat surface (featureless at 10.000X) and from a pyramid-covered surface. Three different orientations of the single crystal have been used to bring the low index directions <111> <110> and <100> as well as the <11 3 1> into the plane of the collector foil. Enhanced ejections from the low index directions are seen to decrease in the order <110> <100> <111>, low index directions not in but near the collector plane can also influence the angular distributions. Generally, the total yield is higher from the pyramid-covered surface than from the flat. (Atomindex citation 13:662577)