Materials Analysis by Ion Backscattering and Channeling. Materials Modification by Ion Irradiation and Implementation.

摘要

A description will be given of the basic processes occuring during ion implantation and ion beam analyses. The usefulness of the backscattering and channeling technique is demonstrated by a discussion of the applications to thin film analysis, studies of diffusion and reactions in thin films, lattice location investigations, disorder analysis and surface studies. Ion implantation is a valuable research tool in metallurgy. The process operates very far from equilibrium conditions and thus will influence near surface properties in a unique way. The observed modifications are related to special microscopic structures which will be considered in detail. (ERA citation 10:028038)