Study of the Microstructure of Silver Films Deposited by Ion Assisted Deposition onto Aluminum Oxide Substrates.

摘要

Ion-assisted deposition (IAD) can be used to modify the microstructure, density, or other properties of thin films. To understand the effects of ion bombardment on film growth, we studied the film morphology and hardness of evaporated Ag films that had been bombarded by Ar ions during deposition. Cross sections of deposited films were examined by scanning electron microscopy, and film hardness was measured with a diamond indenter. Substantial increases in film porosity and surface roughness were seen in the 1000-eV Ar-ion-bombarded specimens, compared to vapor-deposited specimens or to specimens bombarded with 300 or 150-eV ions. The IAD films generally had hardness values greater than that of evaporated films. Low hardness values were obtained for a porous 1000-eV IAD film; these are attributed to the presence of compressible pores. No Ar was detected in the films. 16 refs., 7 figs., 1 tab.