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Effect of bias on thermally stimulated current (TSC) in irradiated MOS devices.

机译:偏压对辐照mOs器件中热刺激电流(TsC)的影响。

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摘要

TSC measurements at varying bias provide significant insight into the density, energy distribution, and location of MOS oxide-trap charge. Under ''proper'' bias conditions, TSC and C-V estimates of oxide-trap charge density agree well. 14 refs., 8 figs.

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