首页> 美国政府科技报告 >Studies of the dependence on oxidation thermal processes of effects on the electrical properties of silicon detectors by fast neutron radiation
【24h】

Studies of the dependence on oxidation thermal processes of effects on the electrical properties of silicon detectors by fast neutron radiation

机译:研究快速中子辐射对硅探测器电性能影响的氧化热过程依赖性

获取原文

摘要

High resistivity silicon detectors along with MOS capacitors made on five silicon dioxides with different thermal conditions (975(degree)C to 1200(degree)C) have been exposed to fast neutron irradiation up to the fluence of a few times 10(sup 14) n/cm(sup 2). New measurement techniques such as capacitance-voltage (C-V) of MOS capacitors and current-voltage (I-V) of back to back diodes (p(sup +)-n(sup (minus))- p(sup +) if n(sup (minus)) is not inverted to p) or resistors (p(sup +)-p-p(sup +) if inverted) have been introduced in this study in monitoring the possible type-inversion (n(yields)p) under high neutron fluence. No type-inversion in the material underneath SiO(sub 2) and the p(sup +) contact has been observed so far in this work for detectors made on the five oxides up to the neutron fluence of a few times 10(sup 13) n/cm(sup 2). However, it has been found that detectors made on higher temperature oxides (T = or

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号