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Studies of the dependence on oxidation thermal processes of effects on the electrical properties of silicon detectors by fast neutron radiation

机译:快速中子辐射对氧化热过程的依赖对硅探测器电性能影响的研究

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High-resistivity silicon detectors along with MOS capacitors made on five silicon dioxides with different thermal conditions (975 degrees C to 1200 degrees C) have been exposed to fast neutron irradiation up to a fluence of a few times 10/sup 14/ n/cm/sup 2/. New measurement techniques such as capacitance-voltage (C-V) of MOS capacitors and current-voltage (I-V) of back-to-back diodes (p/sup +/-n/sup -/-p/sup +/ if n/sup -/ is not inverted to p) or resistors (p/sup +/-p-p/sup +/ if inverted) have been introduced in monitoring the possible type-inversion (n to p) under high neutron fluence. No type-inversion in the material underneath SiO/sub 2/ and the p/sup +/ contact has been observed so far for detectors made on the five oxides up to a neutron fluence of a few times 10/sup 13/ n/cm/sup 2/. However, it has been found that detectors made on higher-temperature oxides (T
机译:高电阻率硅探测器以及在五个具有不同热工况(975摄氏度至1200摄氏度)的二氧化硅上制成的MOS电容器已被暴露于快速中子辐照下,辐照度可达几倍10 / sup 14 / n / cm / sup 2 /。新的测量技术,例如MOS电容器的电容电压(CV)和背对背二极管的电流电压(IV)(p / sup +/- n / sup-/-p / sup + /如果n / sup -/不反转为p)或引入电阻器(p / sup +/- pp / sup + /如果反转),则在高中子注量下监视可能的类型反转(n到p)。到目前为止,对于在五种氧化物上达到中子注量几倍10 / sup 13 / n / cm的五种氧化物制成的检测器,到目前为止,在SiO / sub 2 /和p / sup + /接触下的材料中尚未观察到类型反转。 / sup 2 /。然而,已经发现,在较高的中子注量下(phi <或= 10 / sup 13 / n / cm / sup 2 /),在较高温度的氧化物(T <或= 1100摄氏度)上制成的探测器显示的漏电流增加较少。 。

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