Electrophotographic Patterning for Large Area Electronics

摘要

The goal of this program was to develop an electrophotographic patterning method for Thin-Film Transistors (TFTs) fabrication. The current Active-Matrix Liquid Crystals Display (AMLCD) fabrication method uses multi-step photolithographic masking, deposition, and etching. The objective of this effort was to explore processing alternatives that would eliminate the use of photolithographic equipment and thereby reduce the cost of fabricating TFTs for AMLCDs.