A Comparison of 10.6micrometer Pulsed Laser Damage in Sputtered vs Electron Beam Deposited Ge-Coated KCl,

摘要

Germanium films deposited on KCl substrates by electron beam and sputter techniques have been irradiated at 10.6 micrometers. A comparative damage study of germanium films prepared by these techniques under pulsed apparatus was used for this study. Well characterized RAP Bridgeman and Czochralski grown KCl substrates with (100) and (111) orientation were used.