Improved Electrodeposited Low Contraction Chromium.

摘要

A systematic study was made to optimize the parameters for plating high quality LC chromium using standard chromic acid solutions and solutions containing vanadium additions. The results indicate that deposit strengths were improved substantially by aging the plating solution at 250 A hr/liter and by using current densities in excess of 120 A/sq dm. Under these conditions, hydrogen incorporation was reduced five-fold while hardness, strength, and cathode efficiency were maximized. A further improvement in deposit strength was obtained by adding vanadium as V2O5 at a concentration of 10 g/1 to standard chromic acid solutions. At higher concentrations, inferior deposits were produced that showed surface roughness, porosity, low strength, and higher hydrogen content.