Effect of Cosolvent Additives on Relative Rates of Photooxidation on Semiconductor Surfaces

摘要

The effect of solvent additives on the course of TiO2 photocatalyzed oxygenation of alpha-methylstyrene has been studied. While the addition of small amounts of nonhalogenated alcohols to TiO2 powders suspended in acetonitrile was found to decrease the rate of photooxygenation, added halogenated alcohols increase the rate of reaction. In addition, the solvent additives affect the observed product distribution. Currently, one of the most active areas of research involves the use of semiconductors in the conversion of light into electricity and fuels. In the last several years, a wide range of organic phototransformations at semiconductor surfaces have been discovered and their mechanistic features have been probed. Many organic molecules undergo photooxygenation or photooxidative cleavage when adsorbed on the surface of suspended semiconductor powders. (jes)