Proposal to Study the Interaction of Polyimide Precursors and Thin Polyimide Films with Silicon and Silicon Oxide Surfaces

摘要

The work performed within the research contract N00014-85-K-0641 produced results, which for the first time allowed us to derive a model for the detailed molecular mechanism of adhesion between a polymer and a metal surface. The spectroscopic characterization of polyimide/metal interface was made possible by a vapor deposition technique used to produce polyimide films sufficiently thin to access the interface by photoelectron spectroscopy and Infrared Reflection Absorption Spectroscopy. The polyimide films were prepared by codeposition of oxidianiline (ODA) and 1,2,4,5 Benzenetetracarboxylic Anhydride (PMDA) onto a surface held at 300 K to form polyamic acid. Thin films. (jes)