Time and Space Resolved Electron Impact Excitation Rates in an rf Glow Discharge

摘要

Research on rf glow discharge plasmas was carried out to better understand thefundamental physics and chemistry of important aspects of plasma deposition and etching. A standard reference system for rf plasma processing research was utilized. Power, voltage and current waveforms were monitored and time and space resolved measurements were made using plasma induced emission (PIE). Nanosecond time resolution for PIE greatly expanded the utility of these plasma diagnostics over previous studies. Measurements were carried out with a prototype rf model discharge, atomic argon, concentrating on the important 4s levels 11.5eV above the ground state and the manifold of p levels coupled to these states by strong dipole transitions. Extensive analysis and computer modeling was carried out to reproduce the experimental data obtained and to test assumptions often used for this model system. Models of electron excitation waves were stringently tested and evaluated. The research concentrated on studying details of excitation waveforms as a function of pressure and rf power. Information on electron energy distribution functions were derived from the experimental results. New experimental techniques to enhance time and space resolution were developed.