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首页> 外文期刊>Physica, C. Superconductivity and its applications >Rapid deposition of biaxially-textured CeO2 buffer layers on polycrystalline nickel alloy for superconducting tapes by ion assisted pulsed laser deposition
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Rapid deposition of biaxially-textured CeO2 buffer layers on polycrystalline nickel alloy for superconducting tapes by ion assisted pulsed laser deposition

机译:通过离子辅助脉冲激光沉积在用于超导带的多晶镍合金上快速沉积双轴织构的CeO2缓冲层

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摘要

The long deposition time of sharply textured buffer layer was the main obstacle for the ion beam assisted deposition (IBAD) process to go to large scale fabrication of superconducting tapes. This paper shows that this obstacle can be overcome. (002)-oriented, sharply-textured CeO2 buffer layers with (111) phi-scan full width of half maximum (FWHM) of 10 degrees were deposited by ion beam assisted pulsed laser deposition (PLD) on polycrystalline Hastelloy C in 10 min. The deposition rate was about 3 nm/s. CeO2 film surface was smooth and free of cracks compared with film by inclined substrate deposition (ISD). The IBAD was carried out at small ion-to-atom ratio values, which resulted in CeO2 (200) plane aligned along the incident plane of the ion beam. The J(c) of Y1Ba2Cu3O7-delta (YBCO) film deposited on the buffer layer was 7.3 x 10(5) A/cm(2). (C) 2000 Elsevier Science B.V. All rights reserved. [References: 23]
机译:锋利纹理化的缓​​冲层的长沉积时间是离子束辅助沉积(IBAD)工艺进入超导带大规模生产的主要障碍。本文表明可以克服这一障碍。通过离子束辅助脉冲激光沉积(PLD)在10分钟内,将具有(111)phi-scan半峰全宽(FWHM)为10度的(002)取向,纹理清晰的CeO2缓冲层沉积。沉积速率为约3nm / s。与通过倾斜衬底沉积(ISD)制成的薄膜相比,CeO2薄膜表面光滑且无裂纹。 IBAD是在较小的离子原子比值下进行的,这导致CeO2(200)平面沿离子束的入射平面对齐。沉积在缓冲层上的Y1Ba2Cu3O7-δ(YBCO)膜的J(c)为7.3 x 10(5)A / cm(2)。 (C)2000 Elsevier Science B.V.保留所有权利。 [参考:23]

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