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首页> 外文期刊>Physica status solidi, B. Basic research >Band-to-Band and Band-to-Acceptor Photoluminescence Studies in InSe under Pressure
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Band-to-Band and Band-to-Acceptor Photoluminescence Studies in InSe under Pressure

机译:压力下InSe中的带对带和带对受体光致发光研究

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We report on photoluminescence (PL) measurements under pressure on p-type N-doped InSe at 10 #KAPPA# and on n-type Si-doped InSe at room temperature. Low-temperature PL of N-doped InSe is dominated by a band-to-acceptor peak. From the pressure dependence of the ionization energy of the N related shallow acceptor, the pressure change of the hole effective mass is estimated through the Gerlach-Pollmann model for hydrogenic levels in uniaxial crystals and discussed in the framework of a k.p model. Room temperature PL in Si-doped InSe is dominated by a band-to-band peak exhibiting a pressure shift in agreement with previous works. This PL peak has been measured up to 7 GPa and a steep reversible decrease of its intensity has been observed above 4 GPa. This decrease has been interpreted as a supplementary evidence of a direct-to-indirect gap crossover, already observed in other layered semiconductors.
机译:我们报告了在10#KAPPA#压力下对p型N掺杂InSe和在室温下对n型Si掺杂InSe在压力下的光致发光(PL)测量。 N掺杂InSe的低温PL由能带峰控制。根据N相关浅受体电离能的压力依赖性,通过Gerlach-Pollmann模型估算单轴晶体中氢原子的空穴有效质量的压力变化,并在k.p模型的框架内进行讨论。与先前的工作一致,掺Si InSe中的室温PL由一个带间峰表示,该峰间表现出压力变化。已测量到高达7 GPa的PL峰,并且在4 GPa以上观察到其强度的急剧可逆下降。这种减少已被解释为在其他层状半导体中已经观察到的直接到间接间隙交叉的补充证据。

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