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A review of weak/strong links and junctions in high-T_c superconductors as a transition to a Mott insulator

机译:回顾高T_c超导体中的弱/强连接和结,作为向Mott绝缘子的过渡

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In high-T_c superconductors (HTS), which are layered, doped Mott insulators, weak links occur easily in preparation and growth, being weakened further by irradiation, by impurities and by disorder. CuO-plane weak links are the major obstacle for HTS currents, both dc and radio frequency. They are tunnel junctions that show reduced critical Josephson currents j_(cJ) (A cm~(-2)) and enhanced normal R_(bn) (OMEGA cm~2) and leakage resistances R_(bl) (T < T_c) >= R_(bn) where the degradation of j_(cJ)R_(bn) " DELTA/e with the superconducting energy gap DELTA is specific to HTS. The easy occurrence of weak links and their degradations already in the normal superconducting state are consequences of the space-wise transition to a Mott insulator seam with n_L~(||) localized states by reduced wavefunction overlap at surfaces and by chemical or spatial disorder. The tunnel degradations show up in j_(cJ) propor. to exp(-2kd), in j~(||)_(cJ)R~(||)_(bn) approx =DELTA/10e exp(-Kd) and j~(||)_(cJ)R~(||2)_(bn) approx = j~(||)_(cJ)R~(||2)_(bl) approx =const >= c_0 = 10~(-12) V OMEGA cm~2 for all NCCO, YBCO, BSCCO and TBCCO junctions grown naturally or artificially to date. In-plane tunnel barriers of width d~(||) > 0.2 nm and of height phi~(||) approx =2 eV, housing n_L~(||) approx = 10~(21) cm~(-3) localized states causing R~(||)_(bl) propor. to 1_L~(||), are quantified for the first time by the resonant tunnel model in agreement with all experimental data, especially R~(||)_(bl~-), j~(||)_(cJ)R~(||)_(bn~-) and j~(||)_(cJ)R~(||2)_(bn) degradations. In interface engineered junctions, a modified, seemingly crystalline (YBCO)* layer of low barrier height phi_c< approx = 20 meV and width d_c = 1-5 nm, covered by the standard Mott insulating YBCO, acts as a controllable and integrable tunnel barrier. Perpendicular weak links with the quasi-insulating blocking layer as the tunnel barrier are dominated by d~(perpendicular) >= 0.8 nm and by n~B_L < 10~(21) cm~(-3), as the density of intermediate states depending strongly on doping yields j~(perpendicular)_(cJ)R~(perpendicular)_(bn) and j~(perpendicular)_(cJ)R~(perpendicular 2)_(bn) values which are larger than for in-plane junctions. Comparing HTS junctions with Nb/Nb_2O_(5-y) and Nb/Al/AlO_x(OH)_y junctions shows the way out of this interface chemistry deadlock.
机译:在分层,掺杂的Mott绝缘体的高T_c超导体(HTS)中,在制备和生长中容易发生薄弱环节,并由于辐射,杂质和无序性而进一步弱化。 CuO平面的薄弱环节是直流和射频HTS电流的主要障碍。它们是隧道结,显示出降低的临界约瑟夫逊电流j_(cJ)(A cm〜(-2))和增强的法线R_(bn)(OMEGA cm〜2)和泄漏电阻R_(bl)(T = R_(bn)其中,具有超导能隙DELTA的j_(cJ)R_(bn)“ DELTA / e的退化是高温超导所特有的。弱连接的容易出现及其在正常超导状态下的退化是通过减小波函数在表面上的重叠以及由于化学或空间无序,空间方向过渡到具有n_L〜(||)局部状态的Mott绝缘子接缝,隧道退化表现为j_(cJ)比例,直到exp(-2kd),在j〜(||)_(cJ)R〜(||)_(bn)中大约= DELTA / 10e exp(-Kd)和j〜(||)_(cJ)R〜(|| 2)_ (bn)大约= j〜(||)_(cJ)R〜(|| 2)_(bl)大约= const> = c_0 = 10〜(-12)V OMEGA cm〜2对于所有NCCO,YBCO,迄今为止,BSCCO和TBCCO交界处自然或人工生长,宽度d〜(||)> 0.2 nm,高度phi〜(||)大约= 2 eV,内腔n_L〜(||)大约= 1个0〜(21)cm〜(-3)局部状态,导致R〜(||)_(bl)比例。到1 / n_L〜(||),是通过共振隧道模型首次与所有实验数据一致进行量化的,特别是R〜(||)_(bl〜-),j〜(||)_( cJ)R〜(||)_(bn〜-)和j〜(||)_(cJ)R〜(|| 2)_(bn)退化。在界面工程结中,低势垒高度phi_c <大约= 20 meV,宽度d_c = 1-5 nm的改良的看似晶体(YBCO)*层,被标准的Mott绝缘YBCO覆盖,充当可控且可集成的隧道势垒。作为中间势垒的密度,以准绝缘阻挡层作为隧道势垒的垂直弱连接以d〜(垂直)> = 0.8 nm和n〜B_L <10〜(21)cm〜(-3)为主。强烈取决于掺杂量,其j〜(垂直)_(cJ)R〜(垂直)_(bn)和j〜(垂直)_(cJ)R〜(垂直2)_(bn)的值大于平面交界处。将HTS结与Nb / Nb_2O_(5-y)和Nb / Al / AlO_x(OH)_y结进行比较显示出摆脱这种界面化学僵局的方法。

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