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Structural, electromagnetic and thermoelectric properties of Bi_4O_4S_3 superconductor

机译:Bi_4O_4S_3超导体的结构,电磁和热电性质

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We report on the synthesis and extensive characterization of the layered Bi_4O_4S_3 superconductor. This is the optimally doped sample with T_c ~ 5.3 K out of a series of Bi_6O_4S_4(SO_4)_(1-x) samples synthesized by solid state reaction. The series was prepared towards establishing a phase diagram of the transition temperature as a function of carrier concentration. The crystal structure for Bi_4O_4S_3 shows a different Bi-S-Bi bond angle as compared to that for the parent phase. Scanning electron microscopy images show a platelet-like morphology for Bi_4O_4S_3, signifying the layered structure. While the parent compound is found to be semiconducting, the electrical resistivity of Bi_4O_4S_3 exhibits a T~2 dependence in a small temperature range between 25 and 50 K. The typical dome structure for variation of T_c with dopant concentration is not observed. From the magneto-transport data H_(c2) for Bi_4O_4S_3 is estimated to be ~2.75 T using the WHH approximation and the corresponding coherence length is ~110 ?. Support for multi-band signatures is not seen from the magneto-resistance data. The rf susceptibility data fits well for an S-wave isotropic gap with a gap value higher than the BCS strong coupling limit. Hall measurements confirm the dominance of electronic transport with a charge carrier density of 4.405 × 10~(19) cm~(-3) at 10 K. The experimental value of the Seebeck coefficient at 35 K is well in accord with the calculated value deduced by using the density of charge carriers from Hall experiments. The Sommerfeld constant γ is estimated to be 1.113 mJ K~(-2) mol~(-1). Evidence for thermally activated flux flow is observed and the pinning potential is found to scale as B~(-0.3) for B < 0.1 T and B~(-199) for B > 0.1 T.
机译:我们报告了层状Bi_4O_4S_3超导体的合成和广泛表征。这是通过固态反应合成的一系列Bi_6O_4S_4(SO_4)_(1-x)样品中T_c〜5.3 K的最佳掺杂样品。该系列是为建立转变温度作为载流子浓度的函数的相图而准备的。与母相相比,Bi_4O_4S_3的晶体结构显示出不同的Bi-S-Bi键角。扫描电子显微镜图像显示Bi_4O_4S_3呈片状形态,表示分层结构。虽然发现母体化合物是半导体,但Bi_4O_4S_3的电阻率在25至50 K的较小温度范围内表现出T〜2依赖性。未观察到T_c随掺杂剂浓度变化的典型圆顶结构。使用WHH近似从Bi_4O_4S_3的磁传输数据H_(c2)估计为〜2.75 T,相应的相干长度为〜110?。从磁阻数据中看不到对多频带签名的支持。 rf磁化率数据非常适合于S波各向同性间隙,其间隙值高于BCS强耦合极限。霍尔测量证实了在10 K下电荷载流子密度为4.405×10〜(19)cm〜(-3)时电子传输占主导地位。塞贝克系数在35 K时的实验值与推算出的值非常吻合通过使用霍尔实验的载流子密度。 Sommerfeld常数γ估计为1.113 mJ K〜(-2)mol〜(-1)。观察到热活化的助熔剂流动的证据,并且发现钉扎电位对于B <0.1 T为B〜(-0.3),对于B> 0.1 T为B〜(-199)。

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