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首页> 外文期刊>Structural Chemistry >Gas-phase molecular structure of 1,1,1,2-tetrabromo-2,2-dimethyldisilane: Theoretical and experimental investigation of a super-halogenated disilane and computational investigation of the F, Cl and i analogues
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Gas-phase molecular structure of 1,1,1,2-tetrabromo-2,2-dimethyldisilane: Theoretical and experimental investigation of a super-halogenated disilane and computational investigation of the F, Cl and i analogues

机译:1,1,1,2-四溴-2,2-二甲基乙硅烷的气相分子结构:超卤代乙硅烷的理论和实验研究以及F,Cl和i类似物的计算研究

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The molecular structure of 1,1,1,2-tetrabromo-2,2-dimethyldisilane (Br 3SiSiBrMe2) has been determined in the gas phase by electron diffraction and ab initio molecular-orbital calculations. The computational investigation was used to augment the experimental investigation using the Structure Analysis Restrained by Ab initio Calculations for Electron diffractioN (SARACEN) method. The structure was found to adopt a staggered structure with C s symmetry by both theory and experiment. Important structural parameters (r h1) include: rSi-Si 235.6(5) pm, rSi-C 185.4(3) pm, rSi-Brav 220.3(1) pm, ∠Si-Si-Br(14) 106.1(4), ∠Si-Si-C 109.2(8) and φBr-Si-Si-Br 180.0 (fixed). These experimental observations are supported by theoretical predictions obtained at the MP2/6-311+G*level. An analogous theoretical investigation was also performed for the series X3SiSiXMe_2 (X = F, Cl and I) and structural trends identified. The Si-X bond was observed to lengthen as a function of the halogen substituent, with corresponding changes to the Si-Si-X bond angles in the SiX3 groups. The Si-Si-X bond angle in the SiXMe_2 groups displayed rather different behaviour, and was relatively stable to substitution until X = I. The flexible nature of bond angles about silicon atoms was observed, even in this relatively sterically unhindered system.
机译:1,1,1,2-四溴-2,2-二甲基乙硅烷(Br 3SiSiBrMe2)的分子结构已在气相中通过电子衍射和从头算的分子轨道计算确定。计算研究被用来扩大实验研究的范围,该研究使用了“从头算电子衍射计算”(SARACEN)方法所限制的结构分析。从理论和实验两方面都发现该结构采用C s对称的交错结构。重要的结构参数(r h1)包括:rSi-Si 235.6(5)pm,rSi-C 185.4(3)pm,rSi-Brav 220.3(1)pm,Si-Si-Br(14)106.1(4), ∠Si-Si-C109.2(8)和ΦBr-Si-Si-Br180.0(固定)。这些实验观察得到MP2 / 6-311 + G *级别的理论预测的支持。还对X3SiSiXMe_2系列(X = F,Cl和I)进行了类似的理论研究,并确定了结构趋势。观察到Si-X键根据卤素取代基而变长,并且SiX3基团中的Si-Si-X键角发生相应变化。 SiXMe_2基团中的Si-Si-X键角表现出相当不同的行为,并且在取代之前一直相对稳定,直到X =I。即使在这个相对空间不受阻碍的系统中,也观察到了围绕硅原子的键角的柔性。

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