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首页> 外文期刊>Spectrochimica Acta, Part B. Atomic Spectroscopy >Peak purity assessment by matrix projection for spectral line selection and background correction in inductively coupled plasma optical emission spectrometry
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Peak purity assessment by matrix projection for spectral line selection and background correction in inductively coupled plasma optical emission spectrometry

机译:电感耦合等离子体发射光谱法中通过矩阵投影进行峰纯度评估以进行谱线选择和背景校正

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摘要

This paper describes an improvement of the procedure, proposed previously (Spectrochim. Acta, Part B, 48 (1993) 1517), to provide information about multiplicative and spectral interferences at lines selected for the analysis of samples. The new version of the procedure only requires intensity scans across an analyte line when three solutions are aspirated: a standard solution, the sample solution and the sample spiked with the analyte standard solution. The third solution can be omitted if multiplicative interference is not of interest Like the initial method, the present procedure does not require or assume information about the sample composition nor is the preparation of solutions of suspected interferents required Figures of merit, namely the structured background factor, and the overall spectral interference have been devised and are used with the true detection limit at a line for line evaluation and selection. As the non analyte concomitant contribution to the measured spectrum is estimated,automatic background correction is possible. The proposed method not only allows selection of the spectral line, but can give a good estimate of the analyte concentration prior to a full quantitative analysis.
机译:本文描述了先前提出的程序的改进(Spectrochim。Acta,B部分,第48卷,(1993)1517),以提供有关在选择用于分析样品的生产线上的乘法和光谱干扰的信息。新版本的程序仅需要在抽吸三种溶液(标准溶液,样品溶液和掺有分析物标准溶液的样品)时跨分析物线进行强度扫描。如果不需要倍增干扰,则可以省略第三种解决方案。像最初的方法一样,本程序不需要或不假设有关样品成分的信息,也不需要制备可疑干扰物的解决方案,需要有品质因数,即结构化背景因素已经设计了总谱干扰,并将其与一条线的真实检测极限一起用于线评估和选择。由于估计了非分析物对测量光谱的伴随贡献,因此可以进行自动背景校正。所提出的方法不仅允许选择谱线,而且可以在进行完全定量分析之前对分析物的浓度给出良好的估计。

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