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首页> 外文期刊>Spectrochimica acta, Part A. Molecular and biomolecular spectroscopy >Surface chemical conversion of 3-glycidoxypropyldimethylethoxysilane on hydroxylated silicon surface: FT-IR, contact angle and ellipsometry analysis
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Surface chemical conversion of 3-glycidoxypropyldimethylethoxysilane on hydroxylated silicon surface: FT-IR, contact angle and ellipsometry analysis

机译:3-环氧丙氧基丙基二甲基乙氧基硅烷在羟基化硅表面的表面化学转化:FT-IR,接触角和椭偏分析

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The chemical conversion of the top surface of 3- glycidoxypropyldimethylethoxysilane (GPDMES) on hyroxylated silicon surface has been studied as a function of reaction time. A multiple-step procedure was applied in this study. At first, GPDMES molecules were self-assembled on the hydroxylated silicon surface. The second step was the modification of epoxy groups with 3,3′-iminodipropionitrile and the last step was the amidoximation reaction of nitrile groups. Existence of the monolayers covalently attached to silicon surfaces were revealed by X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy (FT-IR). Modification, conversion and thickness of surfaces were followed by FT-IR and ellipsometry analysis.
机译:研究了3-环氧丙氧基丙基二甲基乙氧基硅烷(GPDMES)在氧化硅表面上的化学转化率与反应时间的关系。在这项研究中应用了多步骤程序。首先,GPDMES分子在羟基硅表面上自组装。第二步是用3,3'-亚氨基二丙腈修饰环氧基,最后一步是腈基的酰胺化反应。通过X射线光电子能谱和傅里叶变换红外光谱(FT-IR)揭示了共价连接到硅表面的单分子膜的存在。 FT-IR和椭偏分析法跟踪表面的改性,转化和厚度。

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