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首页> 外文期刊>Solid state ionics >Oxide ionic conductivity in Pr_2(Ni, Cu, Ga)O_(4 + δ)-(Ce, Sm)O2-δ laminated film estimated with the Hebb-Wagner method
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Oxide ionic conductivity in Pr_2(Ni, Cu, Ga)O_(4 + δ)-(Ce, Sm)O2-δ laminated film estimated with the Hebb-Wagner method

机译:Hebb-Wagner法估算的Pr_2(Ni,Cu,Ga)O_(4 +δ)-(Ce,Sm)O2-δ层压膜中的氧化物离子电导率

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摘要

Oxide ionic conductivity in multilayer nano-thickness film consisting of Cu- and Ga-doped Pr_2NiO_(4 + δ) (PNCG) and Sm-doped CeO_2 (SDC)was measured using an ion blocking technique. Itwas found that oxide ionic conductivity in laminated films along the in-plane direction was higher than that of the SDC bulk, and that electronic hole conductivity was suppressed compared with the PNCG bulk. The estimated activation energy for oxide ionic conductivity in the PNCG/SDC multilayer film was 0.52 eV, a value that is much smaller than those in conventional oxide ionic conductors such as yttria-doped zirconia. The transport number of oxide ionic conductivity (ti, PO_2 = 0.21)was 0.99 to 0.61 at a temperature region from1073 K to 673 K, suggesting that the main carriers in the PNCG/SDC laminated film were oxide ions.
机译:使用离子阻挡技术测量了由Cu和Ga掺杂的Pr_2NiO_(4 +δ)(PNCG)和Sm掺杂的CeO_2(SDC)组成的多层纳米厚度薄膜中的氧化物离子电导率。已经发现,层压膜中沿面内方向的氧化物离子电导率高于SDC块体的氧化物离子电导率,并且与PNCG块体相比,电子空穴电导率被抑制。估计的PNCG / SDC多层膜中的氧化物离子电导率活化能为0.52 eV,该值比常规的氧化物离子导体(如掺钇的氧化锆)中的值小得多。氧化物离子电导率(ti,PO_2 = 0.21)在1073 K至673 K的温度范围内的迁移数为0.99至0.61,表明PNCG / SDC层压膜中的主要载流子为氧化物离子。

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