首页> 外国专利> Ni-Cu ALLOY TARGET MATERIAL FOR Cu ELECTRODE PROTECTIVE FILM AND LAMINATED FILM

Ni-Cu ALLOY TARGET MATERIAL FOR Cu ELECTRODE PROTECTIVE FILM AND LAMINATED FILM

机译:用于铜电极保护膜和叠层膜的Ni-Cu合金靶材

摘要

PROBLEM TO BE SOLVED: To provide a Ni-Cu alloy target material for a Cu electrode protective film, which can form a protective film that can be used as a protective film for a Cu electrode, can suppress deterioration in the electrical characteristics caused by electrolytic corrosion and atomic diffusion of the Cu electrode, can achieve patterning at high precision by wet etching, and has satisfactory adhesion with a transparent electrode, and further which can efficiently perform sputtering, and to provide a laminated film produced using the Ni-Cu alloy target material for a Cu electrode protective film.;SOLUTION: The Ni-Cu alloy target material for a Cu electrode protective film includes: Cu of 15.0 to 55.0 mass%; (Cr, Ti) of 0.5 to 10.0 mass%; and the balance Ni with inevitable impurities. The laminated film is produced by using the Ni-Cu alloy target material for a Cu electrode protective film.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供用于Cu电极保护膜的Ni-Cu合金靶材料,其可以形成可以用作Cu电极的保护膜的保护膜,可以抑制由电解引起的电特性的劣化。腐蚀和铜电极的原子扩散,可以通过湿法蚀刻高精度地形成图案,并且与透明电极具有令人满意的粘合性,并且还可以有效地进行溅射,并且提供使用Ni-Cu合金靶制造的层压膜。溶液:用于Cu电极保护膜的Ni-Cu合金靶材料包括:15.0-55.0质量%的Cu;和(Cr,Ti)为0.5〜10.0质量%。 Ni的余量不可避免地带有杂质。通过使用镍铜合金靶材作为铜电极保护膜来生产层压膜。; COPYRIGHT:(C)2013,JPO&INPIT

著录项

  • 公开/公告号JP2012193444A

    专利类型

  • 公开/公告日2012-10-11

    原文格式PDF

  • 申请/专利权人 DAIDO STEEL CO LTD;

    申请/专利号JP20110134616

  • 申请日2011-06-16

  • 分类号C22C19/00;C22C9/06;C23C14/34;

  • 国家 JP

  • 入库时间 2022-08-21 17:45:00

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