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首页> 外文期刊>Solid state sciences >Carrier transport mechanisms of p-SiC-Si hetero-junctions
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Carrier transport mechanisms of p-SiC-Si hetero-junctions

机译:p-SiC / n-Si异质结的载流子传输机理

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Hetero-junctions have been fabricated on Al-doped silicon carbide thin films onto n-type silicon single crystals using low-pressure chemical vapor deposition method. Temperature-dependent current—voltage measurements and Hall-effect measurements have been performed to determine the electrical properties of the structures. The temperature-dependent l—V characteristics demonstrated that the forward conduction at lower voltages was dominated by thermionic emission process, while, the forward conduction at higher voltages was determined by multi-step tunneling current. The activation energy of saturation current was about 0.32 eV. Hall-effect measurements proved the p-type properties of obtained SiC films. Deduced from the results of Hall measurements, the junction built-in potential was 1.32 V at room temperature. Moreover, using deep level transient spectroscopy measurements, Al_(Si) acceptor ionization energy was estimated.
机译:已经使用低压化学气相沉积法在Al掺杂的碳化硅薄膜上将异质结制造到n型硅单晶上。已经进行了取决于温度的电流-电压测量和霍尔效应测量,以确定结构的电性能。随温度变化的IV特性表明,较低电压下的正向传导受热电子发射过程控制,而较高电压下的正向传导由多步隧穿电流确定。饱和电流的激活能约为0.32 eV。霍尔效应测量证明了所获得的SiC薄膜的p型特性。从霍尔测量的结果推导出,结点内置电势在室温下为1.32V。此外,使用深层瞬态光谱测量,估计Al_(Si)受体电离能。

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