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A novel controllable synthesis of silica nanotube arrays with ultraviolet photoluminescence

机译:紫外光致发光的二氧化硅纳米管阵列的新型可控合成

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摘要

The synthesis of large-scale one-dimensional silica nanotube (SNT) arrays embedded in Si substrate is demonstrated by using the combination of AAO template mask and Ar ion milling technique. The geometry of the SNTs could be precisely controlled by the process parameters, which included that the SNT diameter and the interpore distance were controlled by AAO anodization voltage and H3PO4 pore widening time, while the length of SNT was controlled by ion milling time and AAO aspect ratio. Also, the SNT fabrication parameters could be related to their photoluminescence (PL) emitting properties, when anodized at 40 V, pore widening in H_3PO_4 acid for 70 min and ion milled for 5 min, a strong intensity and stable ultraviolet (UV) light of 3.25 eV (381 nm) emitted from the SNTs under the excitation of 266 nm laser, which could be assumed arising from twofold coordinated silicon lone pair centers in the oxygen deficiency SNTs. The present fabrication of SNT arrays presents a novel method for intensity and frequency adjustable ultraviolet optoelectronic devices.
机译:结合AAO模板掩模和Ar离子铣削技术,证明了嵌入Si衬底的大规模一维二氧化硅纳米管(SNT)阵列的合成。可以通过工艺参数精确控制SNT的几何形状,包括通过AAO阳极氧化电压和H3PO4扩孔时间控制SNT直径和孔间距,而通过离子铣削时间和AAO方面控制SNT的长度比。此外,SNT的制造参数可能与它们的光致发光(PL)发射特性有关,当在40 V电压下进行阳极氧化,在H_3PO_4酸中扩孔70分钟并离子铣削5分钟,强强度和稳定的紫外(UV)光时。在266 nm激光的激发下,SNT发射出3.25 eV(381 nm),可以认为这是由于缺氧SNT中的两个配位的硅孤对中心引起的。 SNT阵列的当前制造提出了一种强度和频率可调的紫外线光电器件的新方法。

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