首页> 外文期刊>Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion >On the possible role of the interfacial inversion layer in the improvement of the performance of hydrogenated amorphous silicon/crystalline silicon heterojunction solar cells [HIT]
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On the possible role of the interfacial inversion layer in the improvement of the performance of hydrogenated amorphous silicon/crystalline silicon heterojunction solar cells [HIT]

机译:界面反转层在改善氢化非晶硅/晶体硅异质结太阳能电池性能方面的可能作用[HIT]

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摘要

The energy band diagram of the hetero-interface between p-type hydrogenated amorphous silicon (a-Si: H(p(+))) and n-type crystalline silicon (c-Si(n)) obtained using AFORS-HET one dimensional device simulations reveals that a p(+) inversion layer is induced at the hetero-interface, in the c-Si side, with or without the presence of a buffer intrinsic a-Si:H(i) spacer. Such an inversion layer controls the performance of the a-Si:H(p(+))/a-Si:H(i)/c-Si(n) HIT cell, because it pushes the p junction 20 nm in the c-Si and acts as the cell effective emitter. The formation of the inversion layer is controlled by the valence band offset and by the positioning of the Fermi energy in the energy band-gap. The latter is influenced by the active doping level in the doped a-Si:H(p(+)) and by the dangling bond defect density in the a-Si:H bulk and at the a-Si:H/c-Si interface. By inserting an intrinsic a-Si:H spacer, the defect density at the interface is strongly reduced, which not only decreases the interface recombination, but also ensures the proper formation of the inversion layer. The study also suggests that significantly reduced band-gap narrowing in the inversion layer emitter contributes to the higher open circuit voltage achieved in the HIT cell compared to c-Si cell with excellent front surface passivation. (C) 2014 Elsevier B.V. All rights reserved.
机译:使用一维AFORS-HET获得的p型氢化非晶硅(a-Si:H(p(+)))和n型晶体硅(c-Si(n))的异质界面能带图器件仿真表明,在存在或不存在缓冲剂本征a-Si:H(i)间隔基的情况下,在c-Si侧的异质界面上都会感应到ap(+)反转层。这样的反型层控制a-Si:H(p(+))/ a-Si:H(i)/ c-Si(n)HIT电池的性能,因为它将p / n结压入20 nm。 c-Si并用作电池有效发射极。反转层的形成由价带偏移和费米能量在能带隙中的位置控制。后者受掺杂的a-Si:H(p(+))中的活性掺杂水平以及a-Si:H块中和a-Si:H / c-Si处悬空键缺陷密度的影响接口。通过插入固有的a-Si:H隔离层,可以大大降低界面处的缺陷密度,这不仅可以减少界面复合,还可以确保正确形成反型层。研究还表明,与具有出色的前表面钝化的c-Si电池相比,在反型层发射极中带隙变窄的明显减少有助于HIT电池中实现更高的开路电压。 (C)2014 Elsevier B.V.保留所有权利。

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