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Determination of the x-ray elastic constants of solid thin films

机译:固体薄膜的X射线弹性常数的测定

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摘要

A new experimental method for determining the x-ray elastic constants (S-1 and (1/2) S-2) of thin films is proposed. The curvatures of the single-crystal substrates before and after depositing thin films are first measured using a high-resolution x-ray rocking curve technique with high-quality monochromatic and high- intensity synchrotron radiation. The residual stresses in the films are then calculated from the change in substrate curvature based on the well-known modified Stoney's equation. The formulae for calculation of S-1 and (1/2) S-2 are deduced based on measured residual stress and the lattice spacing d(psi) versus sin(2) (psi) curves before and after a mechanical loading, while the magnitude of the external loading does not need to be known. Values of (1/2) S-2 of films can even be obtained without loading. Pb(Zr0.52Ti0.48) and LaNiO3 films grown on a single-crystal silicon substrate using pulsed laser deposition are employed to demonstrate the measurement method.
机译:提出了一种测定薄膜X射线弹性常数(S-1和(1/2)S-2)的新方法。首先使用高分辨率的X射线摇摆曲线技术和高质量的单色高强度同步加速器辐射来测量沉积薄膜之前和之后的单晶衬底的曲率。然后,基于众所周知的改进的斯托尼公式,根据基板曲率的变化来计算薄膜中的残余应力。根据测得的残余应力以及机械载荷前后的晶格间距d(psi)与sin(2)(psi)曲线推导S-1和(1/2)S-2的计算公式。外部载荷的大小不需要知道。甚至无需加载即可获得薄膜的(1/2)S-2值。利用脉冲激光沉积在单晶硅衬底上生长的Pb(Zr0.52Ti0.48)和LaNiO3膜来演示该测量方法。

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