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首页> 外文期刊>Separation and Purification Technology >Influence of pH on enantioselective extraction of aromatic acid enantiomers in centrifugal contactor separators: Experiments and simulation
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Influence of pH on enantioselective extraction of aromatic acid enantiomers in centrifugal contactor separators: Experiments and simulation

机译:pH对离心接触器分离器中芳香酸对映体对映选择性萃取的影响:实验与模拟

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Phenylsuccinic acid (PSA) and cc-cyclohexyl-mandelic acid (alpha-CHMA) are dicarboxylic acid and monatomic acid, respectively, and there is effect of solution pH on multistage extraction efficiency for separation of PSA and alpha-CHMA enantiomers. Enantioselective liquid-liquid extraction (ELLE) of PSA and alpha-CHMA enantiomers with hydrophilic hydroxyphenyl-beta-cyclodextrin as extractant (represented by C) was performed in a counter-current cascade of ten centrifugal contactor separators (CCSs) to investigate the influence of pH on extraction efficiency (evaluated with enantiomeric excess, ee and yield, Y) with the HP-beta-CD concentration changing from 0 to 0.1 mol/L. Experimental results show that there is a significant effect of solution pH on ee and Y for multistage extraction of PSA and alpha-CHMA enantiomers. Single and multistage equilibrium models of ELLE were developed to investigate the effect of solution pH on ee and Y. From experiments and simulation, it is concluded that lower pH will be helpful for obtaining higher ee and Y in both exit streams and the optimal pH of 2.5 is proposed. The above results may be very helpful to optimize the extraction efficiency and realize the large-scale production of pure enantiomers. (C) 2014 Elsevier B.V. All rights reserved.
机译:苯丁二酸(PSA)和cc-环己基扁桃酸(α-CHMA)分别是二羧酸和单原子酸,溶液pH值对分离PSA和α-CHMA对映体的多级萃取效率有影响。在十个离心接触器分离器的逆流级联反应中,以亲水性羟苯基-β-环糊精为萃取剂(以C表示),对PSA和α-CHMA对映异构体进行对映选择性液-液萃取(ELLE),以研究pH对萃取效率的影响(用对映体过量ee和产率Y评估),HP-β-CD浓度从0变为0.1 mol / L。实验结果表明,对于PSA和α-CHMA对映异构体的多步萃取,溶液pH值对ee和Y有显着影响。建立ELLE的单级和多级平衡模型,研究溶液pH值对ee和Y的影响。从实验和模拟中得出结论,较低的pH值有助于获得较高的ee和Y的出口流和最佳pH建议2.5。以上结果可能对优化提取效率和实现大规模生产纯对映体很有帮助。 (C)2014 Elsevier B.V.保留所有权利。

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