Wet Corrosion of Sputtered Molybdenum Thin Film on Glass Substrate in Various Acid Solutions

摘要

In this work, wet corrosion behavior of RF magnetron sputtered molybdenum thin films was studied using by electrochemical analysis. The effects of deposition parameters such as RF power and argon pressure on corrosion rate are also examined. The corrosion rate strongly depends both on the process parameters and the type of chemical solutions. Mo thin film dissolves fastest in the nitric acid solution among the various solutions. The dissolution rates increased with increasing RF power but decreased with argon pressure. The relationship between deposition parameter and corrosion rate was discussed in terms of thin film microstructure and susceptibility of corrosion.