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首页> 外文期刊>SID International Symposium: Digest of Technology Papers >Enhancement of Discharge Characteristics Using RF-Plasma Treatment on MgO Layer In 50-in. Full-HD AC-PDPs
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Enhancement of Discharge Characteristics Using RF-Plasma Treatment on MgO Layer In 50-in. Full-HD AC-PDPs

机译:在50英寸厚的MgO层上使用RF等离子处理增强放电特性。全高清AC-PDP

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The characteristics of the MgO layer are known to be an important parameter that affects both the address and sustain discharge characteristics in an ac-PDP. In this paper, to improve the discharge characteristics of 50-in. full-HD ac-PDP with He (35%) - Xe (11%) contents, RF-plasma treatments on the MgO layer are examined under various gases for plasma treatment. The resulting changes in the address and sustain discharge characteristics, including the firing voltage, Vt closed curve, power consumption, luminance, luminous efficiency, and secondary electron coefficient, are then compared for both cases with and without plasma treatment on MgO layer. It is concluded that the Ar plasma treatment can enhance the discharge characteristics, such as the firing voltage and power consumption, which are caused by an increase in the secondary electron coefficient.
机译:已知MgO层的特性是一个重要参数,它会影响ac-PDP中的寻址特性和维持放电特性。本文旨在改善50 in的放电特性。具有He(35%)-Xe(11%)含量的全高清ac-PDP,对MgO层上的RF等离子体处理进行了各种气体等离子体处理的检查。然后,对在MgO层上进行了等离子体处理和不进行等离子体处理的两种情况,都比较了地址和维持放电特性的变化,包括点火电压,Vt闭合曲线,功耗,亮度,发光效率和二次电子系数。结论是,Ar等离子体处理可以增强由二次电子系数的增加引起的放电特性,例如点火电压和功耗。

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