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首页> 外文期刊>SID International Symposium: Digest of Technology Papers >Ga and In Co-Doped Zinc Oxide Films Deposited on Flexible High Gas Barrier Films for Transparent Conductive Electrode
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Ga and In Co-Doped Zinc Oxide Films Deposited on Flexible High Gas Barrier Films for Transparent Conductive Electrode

机译:Ga和In共掺杂氧化锌薄膜沉积在柔性高阻气薄膜上,用于透明导电电极

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摘要

We developed the highly moisture resistance Zinc Oxide films on flexible high gas barrier PEN substrates. After the damp test, changing ratio of sheet resistance were 1.02, this value can be applied the flexible device electrode. We studied the structural, optical and electrical properties of Zinc Oxide films in detail. After a damp test at 60℃, 95%RH for 1000 h, sheet resistance of 200 nm thickness GIZO film on deposited plastic high gas barrier substrate was 30 ohm/sq., and changing ratio of sheet resistance, before and after damp test value was 1.02.
机译:我们在柔性高阻气性PEN基板上开发了高防潮氧化锌膜。经过潮湿试验后,薄层电阻的变化比为1.02,该值可应用于柔性器件电极。我们详细研究了氧化锌薄膜的结构,光学和电学性质。在60℃,95%RH的条件下进行1000小时的潮湿测试后,沉积的塑料高阻气性基材上200 nm厚的GIZO薄膜的薄层电阻为30 ohm / sq。,并且在潮湿测试之前和之后薄层电阻的变化率是1.02。

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