Direct Imaging System by using a UV Pulse Laser and Small Variable Aperture Masks for Color Filter (CF) Fabrication

摘要

We have now developed a CF fabrication system, which have some small variable masks and expose by the UV pulse laser. The system can handle maximum 8th generation substrates. The feature is that the masks consist of 2 movable apertures and the sizes of apertures are relatively small (about 120 × 150 mm for one imaging head).