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Microstereolithography of lead zirconate titanate thick film on silicon substrate

机译:硅衬底上钛酸锆钛酸铅厚膜的微立体光刻

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摘要

The microstereolithography (mu SL) of lead zirconate titanate (PZT) thick films on platinum-buffered silicon substrates is reported for the first time in this paper. Crack-free PZT thick films (80-130 mum thick) have been fabricated by laser direct-write UV polymerization from the HDDA-based UV curable PZT suspensions. The characterization of the fired films shows dielectric permittivities of 120-200, tangent loss of 0.92-2.5% and remnant polarization of 0.9-1.7 muC/cm(2). The field-induced longitudinal piezoelectric coefficient (d(33)) of an 84-mum thick film is 100 pC/N and the piezoelectric voltage coefficient (g(33)) is about 59.5 x 10(-3) V m/N. These results demonstrated the potential for mu SL of advanced piezoelectric microsensors and microactuators. (C) 2000 Elsevier Science B.V. All rights reserved. [References: 24]
机译:本文首次报道了铂缓冲硅衬底上钛酸锆钛酸铅(PZT)厚膜的微立体光刻(mu SL)。无裂纹的PZT厚膜(80-130微米厚)是通过基于HDDA的UV固化PZT悬浮液通过激光直接写入UV聚合制备的。烧成膜的特性表明介电常数为120-200,切线损耗为0.92-2.5%,剩余极化率为0.9-1.7 muC / cm(2)。 84微米厚膜的场致纵向压电系数(d(33))为100 pC / N,压电电压系数(g(33))约为59.5 x 10(-3)V m / N。这些结果证明了先进压电微传感器和微执行器的μSL潜力。 (C)2000 Elsevier Science B.V.保留所有权利。 [参考:24]

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