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首页> 外文期刊>Scripta materialia >Analytical TEM Investigations on Concentration Gradients Surrounding Ni_4Ti_3 Precipitates in Ni-Ti Shape Memory Material
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Analytical TEM Investigations on Concentration Gradients Surrounding Ni_4Ti_3 Precipitates in Ni-Ti Shape Memory Material

机译:Ni-Ti形状记忆材料周围Ni_4Ti_3沉淀物周围的浓度梯度的分析TEM研究

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摘要

Concentration gradients surrounding Ni_4Ti_3 precipitates grown by appropriate annealing in a Ni_(51)Ti_(49) B2 austenite matrix are investigated by a combination of analytical TEM techniques. A Ni depleted zone in the surrounding matrix up to 150 nm away from the matrix-precipitate interface was detected. The size and concentration change of the depletion zone perfectly compensate for the excess Ni in the precipitate. Moreover, since different precipitates are often found in nanoscale proximity, depletion zones from different precipitates can reinforce one another in certain regions.
机译:通过分析TEM技术的结合,研究了通过适当退火在Ni_(51)Ti_(49)B2奥氏体基体中生长的Ni_4Ti_3析出物周围的浓度梯度。在距基质-沉淀物界面150 nm处检测到周围基质中的Ni耗尽区。耗尽区的大小和浓度变化可完美补偿沉淀物中过量的Ni。此外,由于经常在纳米级附近发现不同的沉淀物,因此来自不同沉淀物的耗尽区可以在某些区域相互增强。

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