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In situ TEM observations of room temperature dislocation climb at interfaces in nanolayered Al/Nb composites

机译:纳米Al / Nb复合材料界面处室温位错爬升的原位TEM观察

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摘要

Using in situ nanoindentation, we investigated dislocation-interface interactions in Al/Nb multilayers. Preferential storage of dislocations at interfaces, as opposed to within layers, was observed. Recovery of dislocations was observed to occur through climb in the interfaces. The rapid climb of dislocations is ascribed to high vacancy diffusivity and vacancy concentration in the interfaces. The vacancy formation energy at interfaces, 0.12 eV, as estimated from the experimentally measured climb rates, was found to be significantly lower than in the bulk.
机译:使用原位纳米压痕,我们调查了Al / Nb多层膜中的位错-界面相互作用。观察到与层内相反,界面处位错的优先存储。观察到位错的恢复是通过界面的爬升发生的。位错的快速上升归因于界面中的高空位扩散率和空位浓度。根据实验测得的爬升率估计,界面处的空位形成能为0.12 eV,明显低于整体中的空位形成能。

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