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首页> 外文期刊>Oxidation of Metals >Effects of the Presence of Water Vapour on the Oxidation Behaviour of Low Carbon-Low Silicon Steel in 1 %O_2-N_2 at 1,173 and 1,273 K
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Effects of the Presence of Water Vapour on the Oxidation Behaviour of Low Carbon-Low Silicon Steel in 1 %O_2-N_2 at 1,173 and 1,273 K

机译:水蒸气的存在对低碳低硅钢在1%O_2-N_2中在1,173和1,273 K下的氧化行为的影响

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摘要

The effect of water vapour on the oxidation behaviour of a low carbon and low silicon steel in 1 %O_2-N_2 at 1,173 K (2.5 and 17.2 %H_2O) and 1,273 K (17.2 %H_2O) was examined. In most cases, the oxidation kinetics were linear initially and turned to parabolic after 15 and 30 min, respectively for 1,173 and 1,273 K. However, for oxidation in 1 %O_2-N_2 at 1,273 K for longer than 60 min, the apparent parabolic rate decreased with increased oxidation time. The presence of water vapour resulted in increased oxidation rates, both in the linear and parabolic stages. Improved scale-steel interface adherence was believed to be responsible for the increased oxidation rates. Fast growth of certain oxide grains formed in 1 %O_2-N_2 at 1,273 K and bridging of the fronts of these fast growing grains to form a continuous layer resulted in the formation of a line of porosities inside the scale, thus reducing the total cross-sectional area for outward iron diffusion, and hence reducing the apparent oxidation rate. The presence of 17.2 %H_2O in 1 %O_2-N_2 prevented formation of porosities in the scale.
机译:研究了水蒸气对低碳低硅钢在1%O_2-N_2中在1,173K(2.5和17.2%H_2O)和1,273K(17.2%H_2O)下的氧化行为的影响。在大多数情况下,氧化动力学最初是线性的,在15和30分钟后分别变为1,173和1,273 K,然后变成抛物线。但是,对于在1%O_2-N_2中在1,273 K下氧化超过60分钟的表观抛物线速率随着氧化时间的增加而降低。水蒸气的存在导致线性和抛物线阶段的氧化速率增加。鳞片-钢界面粘附性的改善被认为是导致氧化速率增加的原因。在1%O_2-N_2中在1,273 K处形成的某些氧化物晶粒快速生长,并且这些快速生长的晶粒的前部桥接形成连续层,导致水垢内部形成了一条孔隙线,从而降低了总的铁向外扩散的截面积,因此降低了表观氧化速率。 1%O_2-N_2中存在17.2%H_2O可以防止水垢的形成。

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