Ta-doped In203 transparent conductive films with high transmittance and low resistance

摘要

Ta-doped In203 transparent conductiv oxide (TCO) thin films are deposited on glass substrates by radio-frequency (RF) sputtering at room-temperature. The influence of sputtering power on the structural, morphologic, electrical, and optical properties of the films is investigated by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), Hall measurement, and optical transmission spectroscopy. The obtained films are polycrystalline with a cubic structure and preferentially oriented in the (222) crystallographic direction. The minimum resistivity of 2.8 x 10-4 52 cm is obtained from the film deposited at the sputtering power of 170 W. The average optical transmittance of the films is over 90%.