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Single step formation of indium and tin doped ZnO nanowires by thermal oxidation of indium-zinc and tin-zinc metal films: Growth and optical properties

机译:通过铟锌和锡锌金属膜的热氧化一步形成铟和锡掺杂的ZnO纳米线:生长和光学性质

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Single step transformation of indium-zinc and tin-zinc films into doped ZnO nanowires is demonstrated. In and Sn doped ZnO nanowires arc formed by the annealing of In-Zn and Sn-Zn bilayer films to 500 °C in air. The nanowires of 15-100 nm diameter and lengths up to 2 μm are formed by the self-catalysis mechanism. Thus, by a single step annealing process doped ZnO nanowires can be realized. Independent of processing conditions all the nanostructures are polycrystalline as evidenced from x-ray diffraction patterns. The optical transmission, reflectance and absorption, in the wavelength range between 200 and 2500 nm, have been measured as a function of annealing temperature. It is shown that all the bilayers and the In and Sn doped nanowires can be used as solar absorber materials due to their high absorption, low transmittancc and reflectance, in this region of the spectrum. In certain cases, the nanowires exhibit high transmittance and very low reflectance making them very attractive for use as anti-reflection coatings.
机译:从铟锌和锡锌薄膜到掺杂的ZnO纳米线的单步转化已得到证明。通过在空气中将In-Zn和Sn-Zn双层薄膜退火至500°C,形成In和Sn掺杂的ZnO纳米线。通过自催化机制形成直径15-100 nm的纳米线,长度可达2μm。因此,通过单步退火工艺,可以实现掺杂的ZnO纳米线。如从X射线衍射图所证明的,与加工条件无关,所有纳米结构都是多晶的。已经测量了在200至2500nm之间的波长范围内的光学透射率,反射率和吸收率,其是退火温度的函数。结果表明,所有双层以及掺有In和Sn的纳米线以及双层和掺In和Sn的纳米线由于在光谱的这一区域具有高吸收,低透射和反射率而可以用作太阳能吸收材料。在某些情况下,纳米线表现出高透射率和非常低的反射率,使得它们非常适合用作抗反射涂层。

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