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Effect of substrate temperature and oxygen partial pressure on structural and optical properties of Mg doped ZnO thin films

机译:衬底温度和氧分压对掺Mg的ZnO薄膜结构和光学性能的影响

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Zn0.85Mg0.15O thin films were deposited on quartz substrate by pulsed laser deposition at different oxygen partial pressures and substrate temperatures. XRD results revealed that deposited films were textured along c-axis and maintain wurtzite crystalline symmetry. Increase in grain size, optical band gap energy and emission intensity were noticed with an increase in oxygen partial pressure and substrate temperature up to 1 mTorr and 500 degrees C, respectively. Above these values, the grain size, band gap and emission intensity were decreased due to the segregation of oxygen and accumulation of defects at grain boundaries. (C) 2015 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
机译:在不同的氧气分压和衬底温度下,通过脉冲激光沉积将Zn0.85Mg0.15O薄膜沉积在石英衬底上。 XRD结果表明,沉积的薄膜沿c轴织构并保持纤锌矿晶体对称性。随着氧分压和衬底温度分别升高至1 mTorr和500摄氏度,晶粒尺寸,光学带隙能量和发射强度均增加。高于这些值,由于氧的偏析和缺陷在晶界的积累,晶粒尺寸,带隙和发射强度降低。 (C)2015 Elsevier Ltd和Techna Group S.r.l.版权所有。

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