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首页> 外文期刊>CERAMICS INTERNATIONAL >A simple annealing process to obtain highly transparent and conductive indium doped tin oxide for dye-sensitized solar cells
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A simple annealing process to obtain highly transparent and conductive indium doped tin oxide for dye-sensitized solar cells

机译:一种简单的退火工艺,以获得用于染料敏化太阳能电池的高度透明且导电的铟掺杂氧化锡

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摘要

A simple annealing process is proposed to utilize indium tin oxide (ITO) coated glass substrate in dye sensitized solar cells (DSSCs). It is shown that highly transparent thin films with low sheet resistivity can be obtained by annealing amorphous-phase rich ITO. The deposited ITO films have been extensively characterized through scanning electron microscopy (SEM), X-ray diffraction (XRD), UV-vis spectroscopy and electrical measurements. DSSCs fabricated by the proposed method have achieved a conversion efficiency of up to 4.48%. It is found that, when the film's thickness exceeds the critical thickness, 500 nm, the annealing process causes adverse effects on the film's optoelectronic properties
机译:提出了一种简单的退火工艺,以在染料敏化太阳能电池(DSSC)中使用氧化铟锡(ITO)涂层的玻璃基板。结果表明,通过对非晶相富集的ITO进行退火,可以获得具有低薄层电阻率的高度透明的薄膜。沉积的ITO膜已通过扫描电子显微镜(SEM),X射线衍射(XRD),紫外可见光谱和电学测量得到了广泛表征。通过所提出的方法制造的DSSC已经实现了高达4.48%的转化效率。发现当薄膜的厚度超过临界厚度500 nm时,退火过程会对薄膜的光电性能产生不利影响

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